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卷對卷連續化生長(cháng)CVD設備 RTR-III-80
設備型號：RTR-III-80 設備簡(jiǎn)介：該設備為我司研發(fā)用于石墨烯薄膜連續生長(cháng)或者線(xiàn)性材料的連續的專(zhuān)用設備，此款設備是快速冷卻卷對卷CVD連續生長(cháng)爐，它由高溫生長(cháng)腔體，三路質(zhì)量流量計氣路系統，真空機組，石英管，冷卻裝置，收放卷的密封裝置，自動(dòng)化控制系統組成，兩端分別安裝有進(jìn)料進(jìn)氣真空腔室和出料排氣真空腔室（即收放銅箔或纖維絲的密封裝置），收放密封裝置內分別對應安裝有放卷滾輪和收卷滾輪，所輸出料排氣腔體與爐體之間安裝有冷卻裝置。相對于現有技術(shù)具有快速冷卻、連續生長(cháng)的優(yōu)點(diǎn)，可以進(jìn)行大面積、高質(zhì)量石墨烯的規?；L(cháng)或者線(xiàn)性材料的連續生長(cháng)。（纖維生長(cháng)工藝，配有纖維張力計，可以通過(guò)調節電機轉速，以便達到纖維連續進(jìn)出且受力均勻）
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